Tungsten-Molybdenum Alloy Plate Target For Magnetron Sputtering Coating PVD Arc Ion Plating
1. Information of Tungsten Molybdenum Alloy Plate Target For PVD:
Tungsten-molybdenum alloy plate target is a high-purity tungsten and molybdenum alloy material, which is widely used in various thin film deposition technologies. Below I will give you a detailed introduction to the specifications, technical parameters and uses of tungsten-molybdenum alloy plate targets.
2. Specification of Tungsten Molybdenum Alloy Plate Target For PVD:
Tungsten-molybdenum alloy plate target is usually made by mixing tungsten and molybdenum in a certain proportion. Generally, the tungsten content of tungsten-molybdenum alloy plate target is between 80%-90%, and the molybdenum content is between 10%-20%. between.
Its specifications are generally customized according to different application requirements. Common sizes include diameter 50mm, diameter 100mm, square 100mm*100mm, etc.
| Width, Inches (mm) | Thickness ,Inches (mm) | Tolerance of Thickness , Inches (mm) |
| ≤12 (305) | ≥0.005~0.01 (0.13~0.25) | ±0.001(±0.0254) |
| ≥0.01~0.02 (0.25~0.51) | ±0.002 (±0.0508) |
| ≥0.02 (0.51) | ±10% |
| ≥12~14 (305~610) | ≥0.01~0.025 (0.25~0.64) | ±0.0025 (±0.0635) |
| ≥0.025 (0.64) | ±10% |
| ≥24~30 (610~762) | ≥0.016~0.03 (0.41~0.76) | ±0.003 (±0.0762) |
| ≥0.03 (0.76) | ±10% |
| ≥30~48 (762~1219) | ≥0.04 (1.02) | ±10% |
| ≥0.1875 (4.762) | ±10% |
3. Technical Parameters of Tungsten Molybdenum Alloy Plate Target For PVD:
1). High purity: Tungsten-molybdenum alloy plate target has high purity, usually reaching more than 99.95%.
2). High density: Tungsten-molybdenum alloy plate target has high density, usually between 18.5-19.0 g/cm³.
3). Good thermal stability: Tungsten-molybdenum alloy plate target has good thermal stability and can keep its physical and chemical properties unchanged at high temperature.
4). Good corrosion resistance: Tungsten-molybdenum alloy plate target has good corrosion resistance and can maintain its stable performance in various chemical environments.
4. Application Of Tungsten Molybdenum Alloy Plate Target:
1). Thin film deposition: Tungsten-molybdenum alloy plate target is widely used in various thin film deposition technologies, such as physical vapor deposition (PVD), magnetron sputtering (sputtering), arc ion plating (arc ion plating), etc.
2). Electronic devices: Tungsten-molybdenum alloy plate targets are also used to manufacture various electronic devices, such as photoconductive devices, superconducting materials, semiconductor devices, etc.
3). Medical field: Tungsten-molybdenum alloy plate targets are also widely used in the medical field, such as for the production of radionuclides.
In conclusion, tungsten-molybdenum alloy plate target is a very important material due to its high purity, good thermal stability, corrosion resistance and wide application fields.
Please click below button for learn more our products.
Product Tags:
|
|
PVD Arc Ion Molybdenum Tungsten Alloy Plate Target For Magnetron Sputtering Coating Images
|
